Presentation at 2026 USA ‘SPIE Advanced Lithography + Patterning’

2026-02-26

Multiscale Instruments participated in the 'SPIE Advanced Lithography + Patterning' conference, held in San Jose, California, from February 22 to 26, 2026, to share its latest research achievements.

During the poster session on February 25, the company garnered significant attention from semiconductor experts worldwide by presenting innovative solutions in the fields of ultra-fine pattern processing and metrology.

This presentation served as a key opportunity to demonstrate the excellence of Multiscale Instruments' high-precision metrology technology to the global market. The poster session, in particular, fostered in-depth technical discussions with leading industry engineers and researchers.

Multiscale Instruments remains committed to solidifying its technological leadership through continued participation in global conferences and contributing to the advancement of the semiconductor industry with its pioneering solutions.

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